Laser Etching System for Thin Film Solar Cell manufacturing is equipped with a 532nm/1064nm high power laser. The system can efficiently and accurately etch different thin films on glass substrates. The systems is highly reliable with low operating cost. Customized functionalities and features can be made available on requests.

Features:
1. X-Y-Z three-dimensional adjustment
2. CCD assisted automatic positioning
3. Dust collecting system
4. Laser protecting system
5. Laser beam stabilization system
6. Friendly operating interface, real-time display of etching paths

Advantages:
1. Simple operation, few processing steps
2. Reliable and high production capability
3. A lager etching rang width
4. High processing speed

Applicable Films:
-- A-Si
-- CIS/CIGS
-- CdTe

Specifications:
Glass substrate size: 1100mmX1400mm
Approx. Productivity: 3min/pcs(with two laser beams)
Max etching speed: 1000mm/s
Bearing weight: 150Kg
Repositioning accuracy: +/-0.01mm
Focal length: F=100-200mm
Wavelength: 1064nm/532nm
Exhaust system: Φ150
Air compressor: Up to 0.4Mpa 200L/min
Power supply: 3 phase 380V/40A
System dimension: L3800mm*W1700mm*H2000mm